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Fast smoothing on diamond surface by inductively coupled plasma reactive ion etching | Journal of Materials Research | Cambridge Core
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High temperature reactive ion etching of iridium thin films with aluminum mask in CF4/O2/Ar plasma: AIP Advances: Vol 6, No 8
Effects of combined process of reactive ion etching and dynamic chemical etching on UV laser damage resistance and surface quality of fused silica optics
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4: RIE etch mechanisms. Plasma etching can be divided into four basic... | Download Scientific Diagram
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